Jon R MacErnie

Title: Innovations by Jon R MacErnie

Introduction

Jon R MacErnie is a notable inventor based in Chandler, AZ (US), recognized for his contributions to semiconductor processing technology. With a total of seven patents to his name, MacErnie has made significant advancements in the field, particularly in wafer cleaning and processing methods.

Latest Patents

Among his latest patents is the "Wafer cleaning apparatus and associated wafer processing methods." This invention focuses on an apparatus designed for cleaning, rinsing, and drying semiconductor wafers. The apparatus can be integrated with a Chemical Mechanical Planarization (CMP) machine and features brush boxes with water tracks that facilitate the movement of workpieces. The design ensures that different cleaning agents, such as hydrofluoric acid (HF), are kept segregated, enhancing the cleaning process's efficiency. Another significant patent is the "Mapping system for semiconductor wafer cassettes," which describes an integral machine for polishing, cleaning, rinsing, and drying semiconductor wafers. This system includes a load/unload station with multiple platforms for wafer cassettes, a robotic mechanism for transferring wafers, and a comprehensive cleaning station that incorporates scrub stations, rinsing, and spin-drying capabilities.

Career Highlights

Throughout his career, Jon R MacErnie has worked with prominent companies such as Speedfam-IPEC Corporation and Sony Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

MacErnie has collaborated with notable colleagues, including Periya Gopalan and Chris E Karlsrud, further enhancing his work in the field of semiconductor processing.

Conclusion

Jon R MacErnie's innovative patents and career achievements highlight his significant impact on semiconductor technology. His work continues to influence the industry, paving the way for future advancements in wafer processing methods.