Wheaton, IL, United States of America

Jeffrey B Cunnane


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Jeffrey B. Cunnane

Introduction

Jeffrey B. Cunnane is an accomplished inventor based in Wheaton, IL (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of cleaning processes following Chemical Mechanical Planarization (CMP). His innovative approach has led to the development of a unique cleaning apparatus that enhances the efficiency and effectiveness of semiconductor workpiece cleaning.

Latest Patents

Cunnane holds a patent for a "Post-CMP wet-HF cleaning station." This invention provides an apparatus designed to clean semiconductor workpieces after the CMP procedure. The process begins with scrubbing the workpiece to eliminate slurry material and contaminants. Following this, the workpiece is transported to a chemical-etch cleaning station, where it is positioned horizontally to expose both upper and lower surfaces. The workpiece is then immersed in a cleaning solution that circulates around its surfaces for a sufficient duration to remove oxide layers, contaminants, and micro scratches.

Career Highlights

Cunnane's career is marked by his dedication to advancing semiconductor cleaning technologies. He has worked with Speedfam-IPEC Corporation, where he has been able to apply his expertise in developing innovative solutions for the semiconductor industry. His work has not only improved cleaning processes but has also contributed to the overall efficiency of semiconductor manufacturing.

Collaborations

Throughout his career, Cunnane has collaborated with notable colleagues, including Anand Gupta and Chris E. Karlsrud. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Jeffrey B. Cunnane's contributions to semiconductor cleaning technology exemplify the impact of innovation in the industry. His patent for the Post-CMP wet-HF cleaning station showcases his commitment to improving manufacturing processes. Cunnane's work continues to influence the semiconductor sector, paving the way for future advancements.

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