Hsinchu, Taiwan

An-Hsuan Lee

USPTO Granted Patents = 12 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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12 patents (USPTO):

Title: Innovations of An-Hsuan Lee in Chemical Mechanical Polishing

Introduction

An-Hsuan Lee is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP), with a total of 12 patents to his name. His work focuses on enhancing the efficiency and effectiveness of polishing processes used in semiconductor manufacturing.

Latest Patents

Among his latest patents, An-Hsuan Lee has developed a chemical mechanical polishing slurry composition and a method of polishing a metal layer. This CMP slurry composition includes about 0.1 to 10 parts by weight of a metal oxide and about 0.1 to 10 parts by weight of a chelator, which can be a thiol compound or a thiolether compound. Additionally, he has patented a method for fabricating a polishing pad for CMP processes. This method involves forming an interpenetrating polymer network with a porous top pad that maintains consistent surface roughness during the polishing of a workpiece.

Career Highlights

An-Hsuan Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor processing. His expertise in CMP has positioned him as a key figure in advancing polishing technologies.

Collaborations

An-Hsuan Lee has collaborated with notable colleagues, including Chun-Hung Liao and Chen-Hao Wu, who contribute to the research and development efforts in their field.

Conclusion

An-Hsuan Lee's contributions to chemical mechanical polishing have significantly impacted the semiconductor industry. His innovative patents and ongoing work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a leading inventor in this critical area of technology.

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