Eindhoven, Netherlands

Albertus Aemillius Seyno Sluijterman

This inventor holds 4 USPTO granted patents and 2 published patent applications. Top assignee: Fei Comapny. Active years: 2012-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Albertus Aemillius Seyno Sluijterman. Retrieved from https://idiyas.com/inventor/albertus-aemillius-seyno-sluijterman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2012-2017

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4 patents (USPTO):Explore Patents

Title: Albertus Aemillius Seyno Sluijterman: Innovator in Charged-Particle Microscopy

Introduction

Albertus Aemillius Seyno Sluijterman is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of charged-particle microscopy, holding a total of 4 patents. His work focuses on enhancing the capabilities of microscopy techniques, particularly in the analysis of materials at the microscopic level.

Latest Patents

Sluijterman's latest patents include a method of performing spectroscopy in a transmission charged-particle microscope. This innovative microscope comprises a source of charged particles directed by an illuminator onto a specimen supported by a holder. Charged particles transmitted through the specimen may undergo energy loss, providing valuable information about the specimen. A dispersing device is utilized to disperse the transmitted charged particles into an energy-resolved array of spectral sub-beams distributed along a dispersion direction. The dispersed charged particles are detected by a detector with an assembly of sub-detectors arranged along the dispersion direction, allowing for different detection sensitivities.

Another significant patent involves charged-particle microscopy with enhanced electron detection. This method investigates a flux of output electrons emanating from a sample in response to irradiation by a beam of input charged particles. The method outlines specific steps to analyze the output electrons effectively.

Career Highlights

Sluijterman is associated with FEI Company, where he continues to develop and refine his innovative techniques in microscopy. His work has contributed to advancements in the field, enhancing the understanding of material properties at the microscopic level.

Collaborations

He has collaborated with notable colleagues, including Eric Gerardus Theodoor Bosch and Cornelis Sander Kooijman. These collaborations have further enriched his research and development efforts in charged-particle microscopy.

Conclusion

Albertus Aemillius Seyno Sluijterman is a prominent figure in the field of charged-particle microscopy, with a focus on innovative techniques that enhance material analysis. His contributions through patents and collaborations continue to impact the scientific community positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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