Tokyo, Japan

Akira Fukunaga

This inventor holds 39 USPTO granted patents and 10 published patent applications and 1 EPO patent, primarily in Substrate Processing. Top assignees: Ebara Corporation, Ebara Research Co., Ltd., Takeda Chemical Industries, Inc.. Active years: 1989-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Fukunaga. Retrieved from https://idiyas.com/inventor/akira-fukunaga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 39 

% Patents Active = 71.8

 

Average Co-Inventor Count = 3.4

ph-index = 8

Forward Citations = 239(Granted Patents)


Location History:

  • Fujisawa, JP (1992)
  • Chigasaki, JP (1999 - 2002)
  • Kanagawa-ken, JP (2000 - 2005)
  • Kanagawa, JP (1989 - 2006)
  • Tokyo, JP (2003 - 2014)

Company Filing History:


Years Active: 1989-2026

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Areas of Expertise:
Substrate Cleaning
Thin Film Formation
Electrolytic Machining
Plating Apparatus
Interconnects Formation
Gas Polishing
Metal Film Production
Waste Gas Treatment
Composite Particles
Anion Detection
Semiconductor Device Mounting
Substrate Processing Apparatus
39 patents (USPTO):Explore Patents

Title: Innovations and Achievements of Akira Fukunaga in Patent Development

Introduction

Akira Fukunaga, based in Tokyo, Japan, is a prominent inventor with an impressive portfolio of 36 patents. His innovations primarily focus on advancements in substrate processing and electroplating methods, which play a critical role in the fields of electronics and materials engineering.

Latest Patents

Fukunaga's latest contributions to technology include two significant patents. The first is a "Plating apparatus and plating method," which offers a more efficient approach to forming conductive structures. This method aims to reduce the lengthy conventional plating times that have hindered the practical application of electroplating in creating via plugs essential for three-dimensional packaging. The innovative process outlines forming a conductive film on surfaces, including intricate via holes, followed by a two-step electroplating technique that enhances both speed and efficacy.

His second patent is focused on a "Substrate processing method, substrate processing apparatus, and control program." This method innovatively employs a prior water covering on the substrate surface while rotating it horizontally. The process effectively removes water using a tailored drying gas flow, providing an efficient solution for substrate processing challenges.

Career Highlights

Throughout his career, Akira Fukunaga has made impactful contributions while working with reputable companies such as Ebara Corporation, where he has honed his expertise in the field. His work has led to numerous advancements in existing technologies, showcasing his dedication to innovation and improvement in substrate processing methods.

Collaborations

Fukunaga has collaborated with esteemed professionals in the industry, including Hiroshi Nagasawa and Xinming Wang. These partnerships have facilitated the exchange of ideas and have significantly contributed to the development of his extraordinary patent portfolio.

Conclusion

Akira Fukunaga continues to be a vital force in the realm of innovation, consistently pushing the boundaries of technology within his specialization. His methods and inventions have not only improved processes in substrate processing but have also set new standards for efficiency in electroplating, paving the way for future advancements in this crucial industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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