Akira Eguchi

Title: Akira Eguchi: Innovator in Photoresist Resin Technology

Introduction

Akira Eguchi is a prominent inventor based in Himeji, Japan. He has made significant contributions to the field of photoresist resin technology, holding a total of 5 patents. His work focuses on enhancing the performance and production methods of photoresist resins, which are crucial in semiconductor manufacturing.

Latest Patents

Eguchi's latest patents include innovations such as a photoresist resin, a method for producing photoresist resin, a photoresist resin composition, and a method for forming patterns. These inventions provide a resin that exhibits high resist performance by reducing poorly soluble components in resist solvents. One of his notable patents discloses a photoresist resin containing an acrylic resin, which, when dissolved in propylene glycol monomethyl ether acetate at a 5 wt % resin solid content concentration, achieves a polystyrene equivalent turbidity of 30 or less. Additionally, he has developed a polymer compound that boasts excellent sensitivity, high resolution, and minimal line edge roughness, enabling precise fine pattern formation while reducing post-develop defects.

Career Highlights

Throughout his career, Akira Eguchi has worked with notable companies such as Daicel Corporation and Daicel Chemical Industries, Ltd. His expertise in photoresist technology has positioned him as a key figure in the industry, contributing to advancements that enhance semiconductor manufacturing processes.

Collaborations

Eguchi has collaborated with esteemed colleagues, including Masamichi Nishimura and Mitsuru Ohno, who have contributed to his research and development efforts in the field of photoresist resins.

Conclusion

Akira Eguchi's innovative work in photoresist resin technology has led to significant advancements in the semiconductor industry. His patents reflect a commitment to improving the performance and production methods of essential materials used in modern electronics.