The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Jan. 15, 2009
Akira Eguchi, Himeji, JP;
Masamichi Nishimura, Himeji, JP;
Akira Eguchi, Himeji, JP;
Masamichi Nishimura, Himeji, JP;
Daicel Chemical Industries, Ltd., Osaka, JP;
Abstract
Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 μm or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.