The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Jun. 18, 2020
Applicant:
Daicel Corporation, Osaka, JP;
Inventors:
Akinori Ito, Tokyo, JP;
Akira Eguchi, Tokyo, JP;
Assignee:
DAICEL CORPORATION, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 2/38 (2006.01); C08F 220/18 (2006.01); C08F 220/20 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C08F 2/38 (2013.01); C08F 220/1811 (2020.02); C08F 220/1818 (2020.02); C08F 220/20 (2013.01); C08F 220/283 (2020.02);
Abstract
Provided is a resin that exhibits high resist performance because a poorly soluble component with respect to a resist solvent is reduced, and a production method for the resin. Disclosed is a photoresist resin containing an acrylic resin, in which when the photoresist resin is dissolved in propylene glycol monomethyl ether acetate in such a way that a resin solid content concentration is 5 wt %, a polystyrene equivalent turbidity measured using a method described in 'Drinking Water Testing Methods' of Japan Water Works Association of 2003, Ministry of Health, Labor and Welfare Ordinance No. 261 of Japan is 30 or less.