The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Feb. 03, 2009
Hiroshi Koyama, Himeji, JP;
Kyuhei Kitao, Himeji, JP;
Akira Eguchi, Himeji, JP;
Daicel Chemical Industries, Ltd., Osaka, JP;
Abstract
Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by Formula (1), wherein Rrepresents, e.g., hydrogen or an alkyl group having 1 to 6 carbons; Rrepresents, e.g., a halogen or an alkyl or haloalkyl group having 1 to 6 carbons; 'A' represents an alkylene group having 1 to 6 carbons, oxygen, sulfur, or is nonbonding; 'm' denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbons. The monomer is useful as a monomer component typically for a highly functional polymer, because, when the monomer is applied to a resist resin, the resin is stable and resistant to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.