The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Jun. 17, 2013
Daicel Corporation, Osaka-shi, Osaka, JP;
Daicel Corporation, Osaka-shi, JP;
Abstract
Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects. The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from —O—, —C(═O)—, —C(═O)—O—, —O—C(═O)—O—, —C(═O)—O—C(═O)—, —C(═O)—NH—, —S(═O)—O—, —S(═O)—O—, —OR, —C(═O)—OR, and —CN, where Rrepresents, independently in each occurrence, optionally substituted alkyl.