Daicel Corporation

Daicel Chemical Industries, Ltd.

Akira Eguchi

Masamichi Nishimura

Takashi Maruyama

Akinori Ito

Mitsuru Ohno

Hiroshi Koyama

Kazuhiro Uehara

Kyuhei Kitao

Masayoshi Furukawa

Provided is a monomer that improves solubility in organic solvents, hydrolyzability, and solubility in water after hydrolysis of a resin as well as imparts higher heat resistance to a resin. A resin for a photoresist containing a polymerization unit represented by Formula (Y), wherein Rrepresents a halogen atom or an alkyl group having from 1 to 6 carbons and having a halogen atom; Ris a substituent attached to a ring and represents a halogen atom, an alkyl group that has from 1 to 6 carbons and may have a halogen atom, a hydroxyalkyl group that has from 1 to 6 carbons and may have a halogen atom and has a hydroxyl group moiety which may be protected by a protecting group, a carboxyl group that may form a salt, or a substituted oxycarbonyl group; A represents an alkylene group having from 1 to 6 carbons, an oxygen atom, a sulfur atom, or no bond; m is the number of Rand represents an integer from 0 to 8; X represents an electron-withdrawing substituent; n is the number of X and represents an integer from 1 to 9; B represents a single bond or a linking group; and a steric position of a COOB-group attached to a polymer chain may be either endo or exo.

Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method

Provided is a resin that exhibits high resist performance because a poorly soluble component with respect to a resist solvent is reduced, and a production method for the resin. Disclosed is a photoresist resin containing an acrylic resin, in which when the photoresist resin is dissolved in propylene glycol monomethyl ether acetate in such a way that a resin solid content concentration is 5 wt %, a polystyrene equivalent turbidity measured using a method described in 'Drinking Water Testing Methods' of Japan Water Works Association of 2003, Ministry of Health, Labor and Welfare Ordinance No. 261 of Japan is 30 or less.

Photoresist resin, method for producing photoresist resin, photoresist resin composition, and method for forming pattern

Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects. The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from &#x2014;O&#x2014;, &#x2014;C(&#x2550;O)&#x2014;, &#x2014;C(&#x2550;O)&#x2014;O&#x2014;, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;O&#x2014;, &#x2014;C(&#x2550;O)&#x2014;O&#x2014;C(&#x2550;O)&#x2014;, &#x2014;C(&#x2550;O)&#x2014;NH&#x2014;, &#x2014;S(&#x2550;O)&#x2014;O&#x2014;, &#x2014;S(&#x2550;O)&#x2014;O&#x2014;, &#x2014;OR, &#x2014;C(&#x2550;O)&#x2014;OR, and &#x2014;CN, where Rrepresents, independently in each occurrence, optionally substituted alkyl. 

Polymer compound, resin composition for photoresists, and method for producing semiconductor

Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30&#xb0; C. to 90&#xb0; C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 &#x3bc;m or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.

Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method

Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by Formula (1), wherein Rrepresents, e.g., hydrogen or an alkyl group having 1 to 6 carbons; Rrepresents, e.g., a halogen or an alkyl or haloalkyl group having 1 to 6 carbons; 'A' represents an alkylene group having 1 to 6 carbons, oxygen, sulfur, or is nonbonding; 'm' denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; &#x201c;n&#x201d; denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbons. The monomer is useful as a monomer component typically for a highly functional polymer, because, when the monomer is applied to a resist resin, the resin is stable and resistant to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis. 

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Himeji, Japan

Akira Eguchi