Location History:
- Tama, JP (2007 - 2008)
- Ota-ku, NL (2015)
- Tokyo, JP (2001 - 2022)
Company Filing History:
6 out of 1,142 
4 out of 35,734 
2 out of 194 
Years Active: 2001-2022
Title: Akinori Nakano: Innovator in Substrate Processing Technologies
Introduction
Akinori Nakano is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing, holding a total of 12 patents. His innovative approaches have led to advancements in methods and apparatuses that enhance the efficiency and effectiveness of substrate processing.
Latest Patents
Among his latest patents is a substrate processing method and apparatus designed to achieve uniform trimming across the entire surface of a substrate. This apparatus features a gas channel with a center gas inlet and an additional gas inlet, along with a shower plate that includes multiple holes connected to these inlets. This design creates a gas flow channel that ensures consistent processing. Another notable patent is a method for protecting a layer by forming a hydrocarbon-based extremely thin film. This method involves providing a substrate with a target layer and forming a protective layer that covers the target layer. The protective layer contains a hydrocarbon-based layer created through plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas.
Career Highlights
Akinori Nakano has worked with several notable companies throughout his career, including ASM IP Holding B.V. and NEC Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in substrate processing.
Collaborations
Throughout his career, Nakano has collaborated with talented individuals such as Jun Kawahara and Shintaro Ueda. These collaborations have fostered an environment of innovation and creativity, leading to the development of advanced technologies.
Conclusion
Akinori Nakano's contributions to substrate processing technologies have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing technology and improving processes in substrate processing.