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For the Inventor, By the Inventor

Nirasaki, Japan

Akihiro Kikuchi

This inventor holds 11 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2007-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihiro Kikuchi. Retrieved from https://idiyas.com/inventor/akihiro-kikuchi-zo3u214r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 11

% Patents Active = 27.3

Average Co-Inventor Count = 3.1

ph-index = 7

Forward Citations = 115(Granted Patents)


Location History:

  • Nirasaki, JP (2007 - 2013)
  • Yamanashi, JP (2010 - 2017)
  • Miyagi, JP (2018)

Company Filing History:

goldMedal11 out of 10,947 
 
Tokyo Electron Limited
 patents

Years Active: 2007-2018

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11 patents (USPTO):Explore Patents
1. 9925571 - Method of cleaning substrate processing apparatus (2018-03-27),
2. 9728381 - Plasma processor and plasma processing method (2017-08-08),
3. 9437402 - Plasma processor and plasma processing method (2016-09-06),
4. 8904957 - Plasma processor and plasma processing method (2014-12-09),
5. 8387562 - Plasma processor and plasma processing method (2013-03-05),
6. 8263498 - Semiconductor device fabricating method, plasma processing system and storage medium (2012-09-11),
7. 8056503 - Plasma procesor and plasma processing method (2011-11-15),
8. 7794617 - Plasma etching method, plasma processing apparatus, control program and computer readable storage medium (2010-09-14),
9. 7700492 - Plasma etching method and apparatus, control program and computer-readable storage medium storing the control program (2010-04-20),
10. 7655570 - Etching method, program, computer readable storage medium and plasma processing apparatus (2010-02-02),
11. 7303690 - Microlens forming method (2007-12-04),

Title: Akihiro Kikuchi: Innovator in Substrate Processing Technologies

Introduction

Akihiro Kikuchi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing, holding a total of 11 patents. His innovative work focuses on improving the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Kikuchi's latest patents include a method of cleaning substrate processing apparatuses. This method involves a gas supply part that ejects a process gas through gas passages, which are divided into first and second regions corresponding to different in-plane positions of a substrate. The cleaning process utilizes plasma to enhance the cleaning efficiency by adjusting the flow rates of the process gas in each region. Another notable patent is for a plasma processor and plasma processing method, which incorporates a focus ring surrounding a semiconductor wafer. This design helps control the electric potential of the focus ring, preventing surface arcing during the processing of substrates.

Career Highlights

Kikuchi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing technologies that are critical for the production of high-quality semiconductor devices.

Collaborations

Throughout his career, Kikuchi has collaborated with notable colleagues such as Yuichiro Sakamoto and Takehiro Ueda. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Akihiro Kikuchi's contributions to substrate processing technologies have made a significant impact on the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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