For the Inventor, By the Inventor

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Tekscend Photomask Corp.

USPTO Granted Patents = 2

EPO Patents = 1

Forward Citations = 0

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7 inventors (with patents filed for the assignee):

Hitoshi Maeda (1 out of 13 patents)

Kazutake Taniguchi (1 out of 5 patents)

Kazuaki Matsui (1 out of 2 patents)

4. Hideaki Nakano (1 out of 5 patents)

5. Kenjiro Ichikawa (1 out of 1 patent)

6. Ayumi Goda (1 out of 2 patents)

7. Naoto Yonemaru (1 out of 1 patent)

2 patents: Sort by Forward Citations

1. 12510818 - Reflective mask blank and reflective mask (2025-12-30),

2. 12326656 - Mask blank and method of manufacturing photomask (2025-06-10),

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USPTO Data Jan 1 1976 - Dec 30 2025

2 Patents

#4,066 in Tokyo

#10,973 in Japan

Tekscend Photomask Corp.

Forward Citations = 0

7 inventors:

Hitoshi Maeda (1 out of 13 patents)

Kazutake Taniguchi (1 out of 5 patents)

Kazuaki Matsui (1 out of 2 patents)

4. Hideaki Nakano (1 out of 5 patents)

5. Kenjiro Ichikawa (1 out of 1 patent)

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