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Title: Kazuaki Matsui: Innovator in Photomask Technology
Introduction
Kazuaki Matsui is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, holding a total of 2 patents. His innovative work has advanced the manufacturing processes and performance of photomasks, which are essential in the semiconductor industry.
Latest Patents
Matsui's latest patents include a "Mask Blank and Method of Manufacturing Photomask" and a "Reflective Mask and Method for Manufacturing Same." The first patent describes a mask blank with a structure where a thin film for pattern formation and a hard mask film are stacked on a transparent substrate. The thin film is made of a material containing chromium, while the hard mask film consists of a lower layer formed from silicon and oxygen, and an upper layer made from tantalum and oxygen with an oxygen content of 30 atom % or more. The thickness ratio of the upper layer to the total thickness of the hard mask film is 0.7 or less. The second patent focuses on a reflective mask that features a light-shielding frame with high light-shielding performance. It details a method for manufacturing this mask, which involves side etching or processing to achieve a reverse tapered shape on the multilayered reflective layer, thereby suppressing reflection of extreme ultraviolet light near the edge of the light-shielding frame.
Career Highlights
Throughout his career, Kazuaki Matsui has worked with notable companies such as Toppan Printing Co., Ltd. and Hoya Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in photomask technology.
Collaborations
Matsui has collaborated with talented individuals in his field, including Norihito Fukugami and Yo Sakata. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Kazuaki Matsui's contributions to photomask technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes.