Kazutake Taniguchi

Title: Kazutake Taniguchi: Innovator in Photomask Technology

Introduction

Kazutake Taniguchi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, holding a total of five patents. His work focuses on advancements that enhance the manufacturing processes of semiconductor devices.

Latest Patents

Taniguchi's latest patents include innovative designs for mask blanks and methods of manufacturing photomasks. One notable patent describes a mask blank with a structure where a thin film for pattern formation and a hard mask film are stacked on a transparent substrate. This thin film is made from a material containing chromium, while the hard mask film consists of a lower layer formed from silicon and oxygen, and an upper layer made from tantalum and oxygen. The upper layer's thickness is carefully controlled to be 0.7 or less relative to the total thickness of the hard mask film. Another significant patent involves a mask blank that features a light shielding film made from a silicon nitride-based material. This film exhibits high light shielding performance against ArF exposure light and effectively reduces EMF bias in the pattern of the light shielding film.

Career Highlights

Throughout his career, Taniguchi has worked with notable companies such as Hoya Corporation and Tekscend Photomask Corporation. His expertise in photomask technology has positioned him as a key figure in the semiconductor industry.

Collaborations

Taniguchi has collaborated with esteemed colleagues, including Hiroaki Shishido and Hitoshi Maeda. Their combined efforts have contributed to advancements in photomask technology and semiconductor manufacturing processes.

Conclusion

Kazutake Taniguchi's innovative work in photomask technology has made a lasting impact on the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes and improving product performance.