% Expired Patents = 20.0

Forward Citations = 18

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7 inventors (with patents filed for the assignee):

Takashi Kanno (2 out of 2 patents)

Hideo Sakai (1 out of 12 patents)

Teruyoshi Munakata (1 out of 5 patents)

4. Naoyuki Nohara (1 out of 1 patent)

5. Kimihiro Eguchi (1 out of 1 patent)

6. Kazuyuki Hiramoto (1 out of 1 patent)

7. Kazuo Moriya (1 out of 17 patents)

5 patents: Sort by Forward Citations

1. 8348255 - Disk holding apparatus and defect/foreign material detecting apparatus (2013-01-08),

2. 7633617 - Defective particle measuring apparatus and defective particle measuring method (2009-12-15),

3. 7616300 - Edge flaw detection device (2009-11-10),

4. 7255719 - Wafer rotation device and edge flaw inspection apparataus having the device (2007-08-14),

5. 6798503 - Edge flaw inspection device (2004-09-28),

Company Overview

Raytex Corporation is a leading provider of high-quality textile products for various industries. With a strong focus on innovation and customer satisfaction, Raytex Corporation offers a wide range of fabrics and materials that meet the highest standards of quality and performance. Our commitment to excellence and continuous improvement sets us apart in the market, making us a trusted partner for businesses seeking reliable textile solutions.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

5 Patents

#2 in Tama

#6,654 in Japan

Tama, Japan

Raytex Corporation

Forward Citations = 18

7 inventors:

Takashi Kanno (2 out of 2 patents)

Hideo Sakai (1 out of 12 patents)

Teruyoshi Munakata (1 out of 5 patents)

4. Naoyuki Nohara (1 out of 1 patent)

5. Kimihiro Eguchi (1 out of 1 patent)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Raytex Corporation. Retrieved from https://idiyas.com/company/raytex

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]