Kazuo Moriya

This inventor holds 17 USPTO granted patents, primarily in Defect Inspection Technology. Top assignees: Mitsui Minings & Melting Co., Ltd., Raytex Corporation. Active years: 1988-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuo Moriya. Retrieved from https://idiyas.com/inventor/kazuo-moriya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17

% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 7

Forward Citations = 149(Granted Patents)

Location History:

Atago, JP (1999)
Ageo, JP (1988 - 2004)
Tokyo, JP (1991 - 2009)

Company Filing History:

16 out of 817

Mitsui Minings & Melting Co., Ltd.

Years Active: 1988-2009

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Areas of Expertise:

Defective Particle Measurement

Defect Evaluation

Pattern Inspection

Scattered Light Observation

Surface Inspection

Three-Dimensional Detection

Wiring Pattern Measurement

Photoluminescence Measurement

Internal Defect Detection

Optical Absorption Evaluation

Repetitive Pattern Inspection

Substrate Defect Detection

17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7633617 - Defective particle measuring apparatus and defective particle measuring method (2009-12-15),

2. 6760060 - Observation apparatus for observing a defect in a moving target object using scattered light (2004-07-06),

3. 6236056 - Defect evaluation apparatus for evaluating defects and shape information thereof in an object or on the surface of an object (2001-05-22),

4. 6118133 - Apparatus and method for observing defect having marks making means (2000-09-12),

5. 5995216 - Pattern inspection apparatus (1999-11-30),

6. 5982922 - Pattern inspection apparatus and method (1999-11-09),

7. 5892241 - Apparatus and method for the inspection of scattered resist (1999-04-06),

8. 5808744 - Apparatus for inspecting repetitive patterns (1998-09-15),

9. 5748320 - Wiring pattern line width measuring apparatus (1998-05-05),

10. 5471298 - Method and apparatus for measuring size of particle or defect (1995-11-28),

11. 5428655 - Method and apparatus for three-dimensional detection of particles (1995-06-27),

12. 5424536 - Substrate internal defect and external particle detecting apparatus (1995-06-13),

13. 5381016 - Method and apparatus for measuring photoluminescence in crystal (1995-01-10),

14. 5298963 - Apparatus for inspecting the surface of materials (1994-03-29),

15. 5196716 - Method and apparatus for measuring internal defects for position and (1993-03-23),

Title: Kazuo Moriya: Innovator in Defective Particle Measurement Technology

Introduction

Kazuo Moriya is a prominent inventor based in Ageo, Japan, known for his significant contributions to the field of defective particle measurement technology. With a total of 17 patents to his name, Moriya has developed innovative solutions that enhance the precision and efficiency of particle measurement processes.

Latest Patents

Moriya's latest patents include a defective particle measuring apparatus and a defective particle measuring method. The apparatus utilizes focused laser light to irradiate a sample, capturing scattered light to identify defective particles based on the resulting images. It features a position deviation computing portion that calculates deviations from the focal point, allowing for high-precision size determination of defective particles in a short time. Additionally, the observation apparatus for detecting defects in moving target objects employs a CCD sensor and a laser beam to illuminate the target, ensuring accurate imaging and analysis.

Career Highlights

Throughout his career, Kazuo Moriya has worked with notable companies such as Mitsui Mining & Smelting Co., Ltd. and Raytex Corporation. His experience in these organizations has contributed to his expertise in developing advanced measurement technologies.

Collaborations

Moriya has collaborated with talented individuals in the field, including Katsuyuki Hirai and Takayuki Tsuzura. These partnerships have fostered innovation and the exchange of ideas, further enhancing the impact of his work.

Conclusion

Kazuo Moriya's contributions to defective particle measurement technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in particle analysis, making him a key figure in this specialized field.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]