The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Aug. 08, 2003
Takashi Kanno, Koshigaya, JP;
Kimihiro Eguchi, Tokyo, JP;
Takashi Kanno, Koshigaya, JP;
Kimihiro Eguchi, Tokyo, JP;
Raytex Corporation, Tokyo, JP;
Abstract
A wafer rotating deviceis provided with at least three rollersrotatably provided about axes arranged at parallel intervals and which rotate over the circumferential surface of a disk-shaped wafer, a rotation drive mechanismthat rotates and drives at least one of the rollers, an interval adjustment mechanismcapable of adjusting the dimensions of the intervals of the rollers, a load control devicethat controls the load applied from the rollersto the waferin the radial direction of the waferwhen the waferis clamped between rollers. As a result, a silicon wafer can be rotated without contacting the top and bottom surfaces of the silicon wafer.