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Santa Clara, CA, United States of America

Multibeam Corporation

USPTO Granted Patents = 18

% Expired Patents = 22.2

Forward Citations = 270

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13 inventors (with patents filed for the assignee):

Kevin M Monahan (12 out of 33 patents)

Theodore A Prescop (12 out of 26 patents)

David K Lam (12 out of 28 patents)

4. Michael C Smayling (6 out of 226 patents)

5. Cong Tran (6 out of 6 patents)

6. N William Parker (4 out of 18 patents)

7. Enden David Liu (2 out of 2 patents)

8. Edward Yin (1 out of 9 patents)

9. John C Wiesner (1 out of 1 patent)

10. S Daniel Miller (1 out of 6 patents)

11. Frank Ching-Feng Tsai (1 out of 3 patents)

12. Tirunelveli Subramaniam Ravi (1 out of 22 patents)

13. Jeffery Michael Dech (1 out of 1 patent)

18 patents: Sort by Forward Citations

1. 12451325 - Charged particle beam axial calibration (2025-10-21),

2. 9673114 - Precision substrate material removal using miniature-column charged particle beam arrays (2017-06-06),

3. 9620332 - Charged particle beam substrate inspection using both vector and raster scanning (2017-04-11),

4. 9595419 - Alignment and registration targets for multiple-column charged particle beam lithography and inspection (2017-03-14),

5. 9556521 - Precision deposition using miniature-column charged particle beam arrays (2017-01-31),

6. 9478395 - Alignment and registration targets for multiple-column charged particle beam lithography and inspection (2016-10-25),

7. 9466464 - Precision substrate material removal using miniature-column charged particle beam arrays (2016-10-11),

8. 9466463 - Charged particle beam substrate inspection using both vector and raster scanning (2016-10-11),

9. 9453281 - Precision deposition using miniature-column charged particle beam arrays (2016-09-27),

10. 9207539 - Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems (2015-12-08),

11. 9184027 - Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp (2015-11-10),

12. 8999628 - Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems (2015-04-07),

13. 8999627 - Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp (2015-04-07),

14. 8384048 - Charged particle beam deflection method with separate stage tracking and stage positional error signals (2013-02-26),

15. 8242457 - Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams (2012-08-14),

Company Overview

Multibeam Corporation, based in Santa Clara, California, specializes in advanced technologies for high-performance imaging and sensing solutions. The company focuses on developing innovative systems that enhance data acquisition and processing capabilities across various applications. With a strong emphasis on research and development, Multibeam is dedicated to pushing the boundaries of technology in fields such as telecommunications, aerospace, and industrial automation, contributing to the evolution of smart systems and connectivity.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

18 Patents

#186 in Santa Clara, CA

#4,293 in California

#17,974 in US

#34,244 in the World

Santa Clara, CA, United States of America

Multibeam Corporation

Forward Citations = 270

13 inventors:

Kevin M Monahan (12 out of 33 patents)

Theodore A Prescop (12 out of 26 patents)

David K Lam (12 out of 28 patents)

4. Michael C Smayling (6 out of 226 patents)

5. Cong Tran (6 out of 6 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Multibeam Corporation. Retrieved from https://idiyas.com/company/multibeam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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