Santa Clara, CA, United States of America

Jeffery Michael Dech

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Multibeam Corporation. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Jeffery Michael Dech

Introduction

Jeffery Michael Dech is an accomplished inventor based in Santa Clara, California. He has made significant contributions to the field of charged particle beam technology. His innovative approach has led to advancements that enhance the precision and efficiency of charged particle beam tools.

Latest Patents

One of his notable patents is for a method of operating a charged particle beam tool, specifically focusing on axial calibration. The patent, titled "Charged Particle Beam Axial Calibration," describes a method that involves capturing under-focused and over-focused images of a calibration target. By determining an offset vector between these images, adjustments can be made to the charge distribution of alignment electrodes. This process ensures that the charged particle beam is accurately aligned with the optical axis of the column, thereby improving the overall performance of the tool. Jeffery holds 1 patent in this area.

Career Highlights

Jeffery Michael Dech has been associated with Multibeam Corporation, where he has applied his expertise in charged particle beam technology. His work has contributed to the development of advanced tools that are essential in various applications, including semiconductor manufacturing and materials science.

Conclusion

Jeffery Michael Dech's innovative contributions to charged particle beam technology demonstrate his commitment to advancing the field. His patent for axial calibration reflects his ability to solve complex challenges in precision engineering. Through his work at Multibeam Corporation, he continues to influence the future of charged particle beam applications.

Profile summary based on public USPTO records.
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