Edward Yin

Title: The Innovative Contributions of Edward Yin

Introduction

Edward Yin is a prominent inventor based in Cupertino, California, known for his significant contributions to the field of imaging technology. With a total of nine patents to his name, Yin has made remarkable advancements in the design and manufacturing of image sensors.

Latest Patents

One of his latest patents involves a structure and method of manufacture for a backside thinned imager. This invention incorporates a conformal AlO low thermal budget surface passivation. The passivation approach facilitates the fabrication of backside thinned, backside illuminated silicon image sensors. These sensors feature a thick silicon absorber layer patterned with vertical trenches, which are formed by etching the exposed back surface of the sensor. This design effectively controls photo-carrier diffusion and optical crosstalk. Additionally, his method of manufacture employing conformal AlO surface passivation has been shown to provide high quantum efficiency and low dark current while adhering to the thermal budget constraints of a finished standard foundry-produced CMOS imager. Another notable patent is related to a collimator bonding structure and method. This invention includes a solid-state semiconductor imager with a metallized catch pad and a collimator that has a metallized layer facing the sensor anode. The metallized layer is joined with the catch pad to form a metal bond between the imager and the collimator, with methods of making this assembly also disclosed.

Career Highlights