The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2005
Filed:
Feb. 19, 2001
Edward M. Yin, Cupertino, CA (US);
Alan D. Brodie, Palo Alto, CA (US);
N. William Parker, Fairfield, CA (US);
Frank Ching-feng Tsai, Saratoga, CA (US);
Edward M. Yin, Cupertino, CA (US);
Alan D. Brodie, Palo Alto, CA (US);
N. William Parker, Fairfield, CA (US);
Frank Ching-Feng Tsai, Saratoga, CA (US);
Multibeam Systems, Inc., Santa Clara, CA (US);
Abstract
A multi-column electron beam inspection system is disclosed herein. The system is designed for electron beam inspection of semiconductor wafers with throughput high enough for in-line use. The system includes field emission electron sources, electrostatic electron optical columns, a wafer stage with six degrees of freedom of movement, and image storage and processing systems capable of handling multiple simultaneous image data streams. Each electron optical column is enhanced with an electron gun with redundant field emission sources, a voltage contrast plate to allow voltage contrast imaging of wafers, and an electron optical design for high efficiency secondary electron collection.