John C Wiesner

Title: Innovations of John C Wiesner in Charged Particle Beam Technology

Introduction

John C Wiesner is a notable inventor based in Castro Valley, CA (US). He has made significant contributions to the field of charged particle beam technology. His innovative approach has led to the development of a unique method for patterning resist-coated substrates.

Latest Patents

Wiesner holds a patent for a "Charged particle beam deflection method with separate stage tracking and stage positional error signals." This invention provides a method for patterning a resist-coated substrate carried on a stage, utilizing a charged particle beam. The method involves moving the stage at a nominally constant velocity in a first direction while deflecting the charged particle beam to compensate for the stage's movement. The deflection process includes compensating for the average velocity of the stage and separately addressing the difference between the instantaneous position of the stage and a calculated position based on the average velocity. The invention also features a deflector control circuit designed to implement these separate compensation functions. Wiesner's patent is a testament to his innovative thinking and technical expertise, with a total of 1 patent to his name.

Career Highlights

Wiesner has been associated with Multibeam Corporation, where he has applied his skills and knowledge to advance the company's technological capabilities. His work has been instrumental in enhancing the precision and efficiency of charged particle beam applications.

Conclusion

John C Wiesner's contributions to charged particle beam technology exemplify the spirit of innovation. His patented methods and dedication to advancing technology continue to influence the field significantly.