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Yokohama, Japan

Lasertec Gmbh

USPTO Granted Patents = 59

% Expired Patents = 20.3

Trademarks = 12

Forward Citations = 262

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61 inventors (with patents filed for the assignee):

Haruhiko Kusunose (25 out of 25 patents)

Kiwamu Takehisa (9 out of 21 patents)

Jun Sakuma (7 out of 7 patents)

4. Hiroki Miyai (5 out of 6 patents)

5. Ko Gondaira (4 out of 4 patents)

6. Tsunehito Kohyama (4 out of 4 patents)

7. Hideo Takizawa (4 out of 4 patents)

8. Martin Reisacher (3 out of 14 patents)

9. Hirokazu Seki (3 out of 12 patents)

10. Peter Hildebrand (3 out of 16 patents)

11. Makoto Yonezawa (3 out of 6 patents)

12. Yoshihiro Nishimura (3 out of 3 patents)

13. Michael Kuhl (3 out of 10 patents)

14. Peter Wrba (3 out of 4 patents)

15. Shota Fujiki (3 out of 3 patents)

Core Competencies:

Image Processing

Inspection Apparatus

EUV Mask Inspection

Defect Detection

Light Source

Optical Device

Measurement Method

Focus Adjustment

Illumination Method

Phase Shift Measurement

Laser Microscope

Substrate Inspection

59 patents: Sort by Forward Citations

1. 12750588 - Image processing apparatus, inspection apparatus, review apparatus, image processing method, inspection method, and review method (2026-09-29),

2. 12693232 - Light source apparatus, inspection apparatus, exposure apparatus, light source control method, inspection method, and exposure method (2026-07-28),

3. 12674760 - Optical apparatus and focus correction method (2026-07-07),

4. 12625381 - Illumination apparatus and illumination method (2026-05-12),

5. 12607838 - Calculation method, image-capturing method, and image-capturing apparatus (2026-04-21),

6. 12578281 - Defect inspection apparatus and defect inspection method (2026-03-17),

7. 12566142 - Optical apparatus and examination apparatus (2026-03-03),

8. 12504270 - Calculation method, image-capturing method, and image-capturing apparatus (2025-12-23),

9. 12361536 - EUV mask inspection device, EUV mask inspection method, non-transitory computer-readable medium storing EUV mask inspection program, and EUV mask inspection system including a gray image based on design data of a pattern (2025-07-15),

10. 12308600 - Light source apparatus and inspection apparatus (2025-05-20),

11. 12307736 - Image processing apparatus and image processing method (2025-05-20),

12. 12259339 - Light-source apparatus, inspection apparatus, and adjustment method (2025-03-25),

13. 12050184 - Mask inspection method and mask inspection apparatus (2024-07-30),

14. 11822233 - Image pickup apparatus and focus adjustment method using bending correction to adjust focusing (2023-11-21),

15. 11486693 - Measurement apparatus and measurement method (2022-11-01),

Lasertec GmbH, headquartered in Yokohama, Japan, specializes in advanced optical inspection technology. The company focuses on developing innovative solutions for image processing and defect detection, particularly in the realm of EUV mask inspection. Their expertise extends to the design and manufacturing of inspection apparatus and optical devices, employing cutting-edge measurement methods and focus adjustment techniques. Lasertec's contributions are pivotal in enhancing the precision and reliability of optical systems across various industries.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

59 Patents

#32 in Yokohama

#1,556 in Japan

#12,226 in the World

Yokohama, Japan

Lasertec Gmbh

Forward Citations = 262

61 inventors:

Haruhiko Kusunose (25 out of 25 patents)

Kiwamu Takehisa (9 out of 21 patents)

Jun Sakuma (7 out of 7 patents)

4. Hiroki Miyai (5 out of 6 patents)

5. Ko Gondaira (4 out of 4 patents)

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