Oita, Japan

Hirokazu Seki

USPTO Granted Patents = 11 


Average Co-Inventor Count = 3.9

ph-index = 2

Forward Citations = 22(Granted Patents)


Location History:

  • Yokohama, JP (1998 - 1999)
  • Oita, JP (2020 - 2022)
  • Kumamoto, JP (2022)
  • Kanagawa, JP (2017 - 2024)

Company Filing History:


Years Active: 1998-2025

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):

Title: Hirokazu Seki: Innovator in EUV Mask Inspection Technology

Introduction

Hirokazu Seki is a prominent inventor based in Oita, Japan, known for his significant contributions to the field of semiconductor technology. With a total of 11 patents to his name, Seki has made remarkable advancements in the inspection of extreme ultraviolet (EUV) masks, which are critical in the manufacturing of integrated circuits.

Latest Patents

Seki's latest patents include innovative technologies such as an EUV mask inspection device, an EUV mask inspection method, a non-transitory computer-readable medium storing an EUV mask inspection program, and an EUV mask inspection system that utilizes a gray image based on design data of a pattern. These inventions focus on enhancing the accuracy and efficiency of EUV mask inspections, which are essential for the production of high-performance semiconductor devices.

Career Highlights

Throughout his career, Hirokazu Seki has worked with notable companies, including Sony Semiconductor Solutions Corporation and Asahi Glass Company, Limited. His experience in these organizations has allowed him to develop cutting-edge technologies that push the boundaries of semiconductor manufacturing.

Collaborations

Seki has collaborated with talented individuals in the industry, including Katsuji Kimura and Rei Takamori. These partnerships have fostered innovation and have contributed to the successful development of his patented technologies.

Conclusion

Hirokazu Seki's work in EUV mask inspection technology showcases his dedication to advancing semiconductor manufacturing processes. His innovative patents and collaborations highlight his significant impact on the industry.

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