For the Inventor, By the Inventor

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Chaska, MN, United States of America

Fsi International, Inc.

USPTO Granted Patents = 102

% Expired Patents = 27.5

Trademarks = 4

Forward Citations = 4,368

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126 inventors (with patents filed for the assignee):

Kurt Karl Christenson (16 out of 21 patents)

Robert T Fayfield (11 out of 16 patents)

Jeffery W Butterbaugh (10 out of 23 patents)

4. Kevin L Siefering (9 out of 16 patents)

5. Steven L Nelson (9 out of 10 patents)

6. Brent D Schwab (8 out of 9 patents)

7. Thomas J Wagener (8 out of 25 patents)

8. David C Gray (7 out of 12 patents)

9. Tracy A Gast (5 out of 12 patents)

10. Natarajan Ramanan (5 out of 6 patents)

11. John M Heitzinger (4 out of 10 patents)

12. Kevin G Kemp (4 out of 8 patents)

13. Todd K Maciej (4 out of 5 patents)

14. Vuong P Nguyen (4 out of 4 patents)

15. Daniel J Syverson (4 out of 4 patents)

Core Competencies:

Microelectronic Devices

Substrate Treatment

Rinsing Methodologies

Thermal Processing

Electroless Plating

Wafer Cleaning

Chemical Blending

Cryogenic Aerosol

Fluid Delivery Systems

Surface Conditioning

UV Wafer Heating

Selective Etching

102 patents: Sort by Forward Citations

1. 8235068 - Substrate processing systems and related methods (2012-08-07),

2. 8235062 - Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation (2012-08-07),

3. 8142571 - Process for treatment of semiconductor wafer using water vapor containing environment (2012-03-27),

4. 8104425 - Reagent activator for electroless plating (2012-01-31),

5. 8070884 - Methods for rinsing microelectronic substrates utilizing cool rinse fluid within a gas enviroment including a drying enhancement substance (2011-12-06),

6. 7913706 - Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatuses (2011-03-29),

7. 7819984 - Process for treatment of substrates with water vapor or steam (2010-10-26),

8. 7735378 - Method to measure flow line return fluid density and flow rate (2010-06-15),

9. 7681581 - Compact duct system incorporating moveable and nestable baffles for use in tools used to process microelectronic workpieces with one or more treatment fluids (2010-03-23),

10. 7592264 - Process for removing material from substrates (2009-09-22),

11. 7556697 - System and method for carrying out liquid and subsequent drying treatments on one or more wafers (2009-07-07),

12. 7476616 - Reagent activator for electroless plating (2009-01-13),

13. 7425505 - Use of silyating agents (2008-09-16),

14. 7422031 - Rotary unions, fluid delivery systems, and related methods (2008-09-09),

15. 7404681 - Coating methods and apparatus for coating (2008-07-29),

Company Overview

Fsi International, Inc. is a leading provider of advanced microelectronic processing solutions, headquartered in Chaska, Minnesota. The company specializes in developing and manufacturing innovative technologies for the semiconductor industry, focusing on critical processes such as substrate treatment, wafer cleaning, and thermal processing. With expertise in electroless plating and chemical blending, Fsi International addresses the evolving needs of microelectronic devices, ensuring high performance and reliability in various applications.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

102 Patents

#1 in Chaska, MN

#96 in Minnesota

#3,722 in US

#7,648 in the World

Chaska, MN, United States of America

Fsi International, Inc.

Forward Citations = 4,368

126 inventors:

Kurt Karl Christenson (16 out of 21 patents)

Robert T Fayfield (11 out of 16 patents)

Jeffery W Butterbaugh (10 out of 23 patents)

4. Kevin L Siefering (9 out of 16 patents)

5. Steven L Nelson (9 out of 10 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Fsi International, Inc.. Retrieved from https://idiyas.com/company/fsi-international

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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