Daniel J Syverson

Title: **The Innovative Mind of Daniel J. Syverson**

Introduction:

Daniel J. Syverson is a remarkable inventor based in Robbinsdale, MN, recognized for his contributions to semiconductor processing technology. With a total of four patents to his name, Syverson has made significant advancements in the ways that wafers are etched and processed, paving the way for more efficient semiconductor manufacturing.

Latest Patents:

Among his latest patents, Daniel Syverson has developed an "Etch Chamber with Gas Dispersing Membrane," which enables processing gases in an etching chamber for semiconductor wafers. This innovation features a porous plastic membrane strategically interposed between the gas source and the wafer, ensuring optimal gas dispersion. Another notable invention is an "Apparatus for Wafer Processing with In Situ Rinse." This apparatus includes a head that defines an etching chamber, allowing the sidewall to slide along the base. It facilitates the efficient discharge of rinsing water with a specially designed deflector ring, providing ease of access for wafer insertion and replacement.

Career Highlights:

Syverson's career is marked by his role at FSi International, Inc., where his innovative ideas have helped drive the development of advanced semiconductor processing equipment. His work on the aforementioned patents exemplifies his dedication to enhancing the capabilities of wafer processing.

Collaborations:

Throughout his career, Syverson has collaborated with notable colleagues, including Richard E. Novak and Rex L. Biggerstaff, contributing to the advancement of technologies and solutions within the semiconductor industry.

Conclusion:

Daniel J. Syverson's inventive spirit and commitment to semiconductor technology are evident through his patents and collaborative efforts. His innovations are not only significant to his company but also play a crucial role in the broader technology landscape, addressing the ever-evolving demands of semiconductor manufacturing.