The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 1989
Filed:
Sep. 22, 1988
Applicant:
Inventor:
Daniel J Syverson, Robbinsdale, MN (US);
Assignee:
FSI International, Inc., Chaska, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156646 ; 156639 ; 156653 ; 156657 ; 156345 ;
Abstract
An enclosed chamber is provided to confine wafers to be processed with an etchent gas, and requiring moisture at the surface of the wafer in order to initiate the etching. Gases flowed over the face of the wafer and may be flowed across the backside of the wafer to controllably produce or restrict the etching, according to the nature of the gas supplied and flowed across the wafer.