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Woburn, MA, United States of America

Cvd, Incorporated

USPTO Granted Patents = 37

Trademarks = 4

Forward Citations = 1,294

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23 inventors (with patents filed for the assignee):

Jitendra Singh Goela (15 out of 44 patents)

Raymond L Taylor (14 out of 14 patents)

Lee E Burns (14 out of 14 patents)

4. Michael A Pickering (10 out of 29 patents)

5. Benjamin C Hui (8 out of 12 patents)

6. James C MacDonald (7 out of 8 patents)

7. Ravindra K Kanjolia (4 out of 4 patents)

8. Alexander Teverovsky (3 out of 5 patents)

9. Zlatko X Salihbegovic (2 out of 19 patents)

10. Jeffery L Kirsch (2 out of 2 patents)

11. Jorg Lorberth (2 out of 4 patents)

12. Luis I Victoriano (2 out of 2 patents)

13. Ravi K Kanjolia (2 out of 2 patents)

14. Joseph T Keeley (2 out of 2 patents)

15. Andreas A Melas (2 out of 9 patents)

Core Competencies:

Chemical Vapor Deposition

Silicon Carbide

Zinc Sulfide

Lightweight Mirrors

Thermal Conductivity

Composite Materials

Laminates

Optical Materials

Thermocouple Protection

Indium Oxide

37 patents: Sort by Forward Citations

1. 6464912 - Method for producing near-net shape free standing articles by chemical vapor deposition (2002-10-15),

2. 6221482 - Low stress, water-clear zinc sulfide (2001-04-24),

3. 6083561 - Low scatter, high quality water clear zinc sulfide (2000-07-04),

4. 6042758 - Precision replication by chemical vapor deposition (2000-03-28),

5. 5741445 - Method of making lightweight closed-back mirror (1998-04-21),

6. 5686195 - Process for an improved laminate of ZnSe and ZnS (1997-11-11),

7. 5683028 - Bonding of silicon carbide components (1997-11-04),

8. 5654034 - Composite thermocouple protection tubes (1997-08-05),

9. 5618594 - Composite thermocouple protection tubes (1997-04-08),

10. 5612132 - Chemical vapor deposition-produced silicon carbide having improved (1997-03-18),

11. 5604151 - Chemical vapor deposition-produced silicon carbide having improved (1997-02-18),

12. 5584936 - Susceptor for semiconductor wafer processing (1996-12-17),

13. 5502227 - Liquid indium source (1996-03-26),

14. 5476549 - Process for an improved laminate of ZnSe and ZnS (1995-12-19),

15. 5474613 - Chemical vapor deposition furnace and furnace apparatus (1995-12-12),

Company Overview

Cvd, Incorporated is a technology company based in Woburn, Massachusetts, specializing in advanced materials and chemical vapor deposition (CVD) systems. The organization focuses on developing innovative solutions for various industries, including semiconductor manufacturing, aerospace, and energy. Cvd's expertise lies in creating high-performance materials and equipment that enhance production processes and product quality, positioning the company as a key player in the field of materials science and engineering.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

37 Patents

#18 in Woburn, MA

#538 in Massachusetts

#9,251 in US

#18,260 in the World

Woburn, MA, United States of America

Cvd, Incorporated

Forward Citations = 1,294

23 inventors:

Jitendra Singh Goela (15 out of 44 patents)

Raymond L Taylor (14 out of 14 patents)

Lee E Burns (14 out of 14 patents)

4. Michael A Pickering (10 out of 29 patents)

5. Benjamin C Hui (8 out of 12 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Cvd, Incorporated. Retrieved from https://idiyas.com/company/cvd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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