Ravindra K Kanjolia

Title: The Innovative Contributions of Ravindra K Kanjolia

Introduction

Ravindra K Kanjolia is a notable inventor based in North Andover, MA (US). He has made significant contributions to the field of materials science and engineering, particularly in the area of semiconductor manufacturing. With a total of 4 patents to his name, Kanjolia's work has had a profound impact on the industry.

Latest Patents

Kanjolia's latest patents include a liquid indium source that provides a uniform dosimetry of vapor phase trimethylindium. This is achieved by dissolving trimethylindium in a C.sub.3 -C.sub.5 trialkylindium and bubbling an inert carrier gas through the solution. Another significant patent involves the purification of trialkylgallium, where group II B p-type impurities, particularly Zn, Hg, and Cd, are removed by contacting the trialkylgallium with a metallic gallium-containing melt. Additionally, he has developed a method for synthesizing trialkylgallium by contacting a dialkyl group II B compound with a metallic gallium-containing melt.

Career Highlights

Kanjolia is currently employed at CVD, Incorporated, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of materials used in various applications, particularly in the semiconductor industry.

Collaborations

Some of Kanjolia's notable coworkers include Benjamin C Hui and Jorg Lorberth. Their collaborative efforts have contributed to the successful development of various projects and patents.

Conclusion

Ravindra K Kanjolia's contributions to the field of materials science and engineering are commendable. His innovative patents and ongoing work at CVD, Incorporated highlight his dedication to advancing technology in the semiconductor industry.