Joseph T Keeley

Title: Joseph T Keeley: Innovator in Chemical Vapor Deposition

Introduction

Joseph T Keeley is a notable inventor based in Woburn, MA (US). He has made significant contributions to the field of chemical vapor deposition, holding 2 patents that showcase his innovative approaches to material replication and deposition techniques.

Latest Patents

Keeley's latest patents include a chemical vapor deposition process designed to replicate the finish and figure of polished preshaped structures, such as mirrors. This process allows for the direct replication of these structures with minimal polishing required for the final product. The original substrate can be reused for further replication, making the process efficient and sustainable. A key feature of this method is a pretreatment step that involves forming an oxide layer and a carbon layer on the polished substrate. This carbon layer facilitates easy separation of the substrate and the replica, which would otherwise be bound together.

Another significant patent by Keeley is the selective area chemical vapor deposition technique. This fluid dynamic method and apparatus isolate a predetermined deposition area within a hot-walled chemical vapor deposition chamber. By limiting deposition to this specific area, the technique reduces stress and cracking in materials produced by chemical vapor deposition. It also prevents backside growth and is particularly useful in fabricating large, lightweight mirrors.

Career Highlights

Joseph T Keeley is associated with CVD, Incorporated, where he applies his expertise in chemical vapor deposition. His work has contributed to advancements in the field, particularly in the replication of high-quality surfaces and the production of lightweight materials.

Collaborations

Keeley has collaborated with notable colleagues, including Michael A Pickering and Raymond L Taylor. Their combined efforts have furthered the development of innovative techniques in chemical vapor deposition.

Conclusion

Joseph T Keeley stands out as an influential inventor in the realm of chemical vapor deposition. His patents reflect a commitment to innovation and efficiency in material replication processes. His contributions continue to impact the industry positively.