The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2000
Filed:
Feb. 05, 1998
Applicant:
Inventors:
Jitendra Singh Goela, Andover, MA (US);
Zlatko Salihbegovic, New Iberia, LA (US);
Assignee:
CVD, Inc., Woburn, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
42725533 ; 42725531 ; 427166 ;
Abstract
An improved chemical vapor deposition (CVD) process which is capable of providing low-scatter water-clear zinc sulfide bulk material is described. The improved method also minimizes bowing, or induced curvature, in the product bulk material. The product zinc sulfide material can be processed into thicker windows and optical devices than was possible with the articles produced by the previous CVD process. The improved process provides for a controlled gradual initial ramping up of the deposition rate and a controlled initial ramping down of the substrate temperature.