Dracut, MA, United States of America

Michael A Pickering

This inventor holds 29 USPTO granted patents and 1 published patent application and 3 EPO patents, primarily in Silicon Carbide Processing. Top assignees: Cvd, Incorporated, Rohm & Haas Electronic Materials LLC, Shipley Company LLC. Active years: 1991-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael A Pickering. Retrieved from https://idiyas.com/inventor/michael-a-pickering

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 93.1


Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 588(Granted Patents)


Location History:

  • North Chelmsford, MA (US) (2013)
  • Dracut, MA (US) (1991 - 2018)

Company Filing History:


Years Active: 1991-2018

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Areas of Expertise:
Zinc Sulfide Hardness
Silicon Carbide
Semiconductor Processing
Chemical Vapor Deposition
Free-Standing Materials
Thermal Conductivity
Wafer Holding
Opaque Silicon Carbide
Low Resistivity
Near-Net Shape
Lightweight Structures
Highly Polishable
29 patents (USPTO):Explore Patents

Title: The Inventor Profile of Michael A Pickering

Introduction: Michael A Pickering is a renowned inventor based in Dracut, MA (US) known for his innovative contributions in various fields.

Latest Patents: Michael A Pickering holds several patents in the areas of technology and engineering, showcasing his dedication to advancing these industries.

Career Highlights: With a successful career spanning over two decades, Michael A Pickering has worked on groundbreaking projects that have significantly impacted the technological landscape.

Collaborations: Throughout his career, Michael A Pickering has collaborated with leading companies, research institutions, and universities to bring his inventions to life and make a lasting impact on society.

Conclusion: Michael A Pickering's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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