The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2013
Filed:
Apr. 17, 2012
Heather A. G. Stern, Chelmsford, MA (US);
Vincent Difilippo, North Chelmsford, MA (US);
Jitendra S. Goela, Andover, MA (US);
Michael A. Pickering, North Chelmsford, MA (US);
Hua Bai, Lake Jackson, TX (US);
Debashis Chakraborty, Lake Jackson, TX (US);
Hangyao Wang, Pearland, TX (US);
Heather A. G. Stern, Chelmsford, MA (US);
Vincent DiFilippo, North Chelmsford, MA (US);
Jitendra S. Goela, Andover, MA (US);
Michael A. Pickering, North Chelmsford, MA (US);
Hua Bai, Lake Jackson, TX (US);
Debashis Chakraborty, Lake Jackson, TX (US);
Hangyao Wang, Pearland, TX (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
An apparatus includes a manifold with a chamber for mixing multiple reactants. Gases are jetted into the manifold by a plurality of inlet injectors. The inlet injectors are arranged such that the gases passing into the manifold impinge on each other at a common point to form a mixture. The mixture passes through a plurality of holes in one side of the manifold into a deposition chamber where the mixture of gases impinges on additional gases at a common point to provide a reaction resulting in deposition of solid materials in the deposition chamber. The solid materials are free-standing.