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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9156785 B1

PDFFull Text
Date of Patent:
Oct. 13, 2015

Filed:

Nov. 15, 2011

Base reactive photoacid generators and photoresists comprising same

Applicants:

Emad Aqad, Northborough, MA (US);

Mingqi LI, Shrewsbury, MA (US);

Cheng-bai Xu, Southboro, MA (US);

Deyan Wang, Hudson, MA (US);

Cong Liu, Shrewsbury, MA (US);

Joon Seok OH, Natick, MA (US);

Shintaro Yamada, Shrewsbury, MA (US);

Inventors:

Emad Aqad, Northborough, MA (US);

Mingqi Li, Shrewsbury, MA (US);

Cheng-Bai Xu, Southboro, MA (US);

Deyan Wang, Hudson, MA (US);

Cong Liu, Shrewsbury, MA (US);

Joon Seok Oh, Natick, MA (US);

Shintaro Yamada, Shrewsbury, MA (US);

Assignee:

Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);

Attorney:

S. Matthew Cairns

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C07C 303/32 (2006.01); C07C 309/19 (2006.01); C07C 309/24 (2006.01); C08F 220/22 (2006.01); C08F 228/02 (2006.01); C07C 309/04 (2006.01); C07C 309/08 (2006.01); C07C 309/06 (2006.01); C07C 309/12 (2006.01); C07C 309/20 (2006.01); C07C 309/23 (2006.01); C07C 381/12 (2006.01); G03F 7/38 (2006.01); C07C 63/72 (2006.01); C07C 309/17 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
C07C 381/12 (2013.01); C07C 63/72 (2013.01); C07C 303/32 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/08 (2013.01); C07C 309/12 (2013.01); C07C 309/17 (2013.01); C07C 309/19 (2013.01); C07C 309/20 (2013.01); C07C 309/23 (2013.01); C07C 309/24 (2013.01); C08F 220/22 (2013.01); C08F 228/02 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/38 (2013.01); C07C 2102/42 (2013.01); G03F 7/2041 (2013.01);
Abstract

This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.

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