Company Filing History:
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Years Active: 2015-2021
Title: Joon Seok Oh: Innovator in Photolithography
Introduction
Joon Seok Oh is a notable inventor based in Natick, MA (US), recognized for his contributions to the field of photolithography. With a total of two patents to his name, he has made significant advancements in photoresist compositions that are essential for modern lithographic processes.
Latest Patents
Joon Seok Oh's latest patents include innovative compositions comprising base-reactive components and processes for photolithography. One of his notable inventions provides new photoresist compositions that are particularly useful for immersion lithography. These preferred photoresist compositions include materials with base reactive groups and polar groups distinct from the base reactive groups. Additionally, his work emphasizes the importance of reducing the leaching of resist materials into immersion fluids during processing. Another patent focuses on new photoacid generator compounds and photoresist compositions that incorporate these compounds, specifically those with base-cleavable groups.
Career Highlights
Throughout his career, Joon Seok Oh has worked with prominent companies in the industry, including Rohm and Haas Electronic Materials LLC and Dow Global Technologies LLC. His experience in these organizations has allowed him to develop and refine his innovative ideas in photolithography.
Collaborations
Joon Seok Oh has collaborated with talented individuals such as Mingqi Li and Cheng-Bai Xu, contributing to the advancement of technologies in his field.
Conclusion
Joon Seok Oh's work in photolithography showcases his innovative spirit and dedication to advancing technology. His patents reflect significant contributions that enhance the efficiency and effectiveness of lithographic processes.