The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Feb. 23, 2004
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanevsky, Haifa, IL;
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael E. Adel, Zichron Ya'akov, IL;
Anatoly Fabrikant, Fremont, CA (US);
Mark Ghinovker, Migdal Ha'Emek, IL;
John Fielden, Los Altos, CA (US);
Noah Bareket, Saratoga, CA (US);
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanevsky, Haifa, IL;
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael E. Adel, Zichron Ya'akov, IL;
Anatoly Fabrikant, Fremont, CA (US);
Mark Ghinovker, Migdal Ha'Emek, IL;
John Fielden, Los Altos, CA (US);
Noah Bareket, Saratoga, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets target that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a plurality of optical signals are measured at a plurality of incident angles, wherein there are predefined offsets between the first and second structures. An overlay error is then determined between the first and second structures by analyzing the measured optical signals at the plurality of incident angles from the periodic targets using a scatterometry overlay technique based on the predefined offsets without using a calibration operation.