The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Sep. 22, 2003
Arie Jeffrey Den Boef, Waarle, NL;
Frank Bornebroek, Eindhoven, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Mircea Dusa, Campbell, CA (US);
Richard Johannes Franciscus Van Haren, Veldhoven, NL;
Antoine Gaston Marie Kiers, Veldhoven, NL;
Justin Lloyd Kreuzer, Trumbull, CT (US);
Maurits Van Der Schaar, Veldhoven, NL;
Paul Jacques Van Wijnen, Veldhoven, NL;
Everhardus Cornelis Mos, Eindhoven, NL;
Pieter Willem Herman DE Jager, Rotterdam, NL;
Hans Van Der Laan, Veldhoven, NL;
Paul Frank Luehrmann, Santa FE, NM (US);
Arie Jeffrey Den Boef, Waarle, NL;
Frank Bornebroek, Eindhoven, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Mircea Dusa, Campbell, CA (US);
Richard Johannes Franciscus Van Haren, Veldhoven, NL;
Antoine Gaston Marie Kiers, Veldhoven, NL;
Justin Lloyd Kreuzer, Trumbull, CT (US);
Maurits Van Der Schaar, Veldhoven, NL;
Paul Jacques Van Wijnen, Veldhoven, NL;
Everhardus Cornelis Mos, Eindhoven, NL;
Pieter Willem Herman De Jager, Rotterdam, NL;
Hans Van Der Laan, Veldhoven, NL;
Paul Frank Luehrmann, Santa FE, NM (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be inspected, directing light at the marker, obtaining a first measurement of the position of the marker via detection of diffracted light of a particular wavelength or diffraction angle, obtaining a second measurement of the position of the marker via detection of diffracted light of a different wavelength or diffraction angle, and comparing the first and second measured positions to determine a shift indicative of the degree of asymmetry of the marker.