The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
Feb. 04, 2003
Kurt Lehman, Menlo Park, CA (US);
Charles Chen, Sunnyvale, CA (US);
Ronald L. Allen, San Jose, CA (US);
Robert Shinagawa, Cupertino, CA (US);
Anantha Sethuraman, Palo Alto, CA (US);
Christopher F. Bevis, Los Gatos, CA (US);
Thanassis Trikas, Redwood City, CA (US);
Haiguang Chen, Millbrae, CA (US);
Ching Ling Meng, Fremont, CA (US);
Kurt Lehman, Menlo Park, CA (US);
Charles Chen, Sunnyvale, CA (US);
Ronald L. Allen, San Jose, CA (US);
Robert Shinagawa, Cupertino, CA (US);
Anantha Sethuraman, Palo Alto, CA (US);
Christopher F. Bevis, Los Gatos, CA (US);
Thanassis Trikas, Redwood City, CA (US);
Haiguang Chen, Millbrae, CA (US);
Ching Ling Meng, Fremont, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing are provided. One method includes scanning a specimen with a measurement device during polishing to generate output signals at measurement spots on the specimen. The method may also include determining a characteristic of polishing at the measurement spots from the output signals. In addition, the method may include determining relative or absolute locations of the measurement spots on the specimen. The method may further include generating a two-dimensional map of the characteristic at the relative or absolute locations of the measurement spots on the specimen. In some embodiments, the relative locations of the measurement spots may be determined from a representative scan path of the measurement device and an average spacing between starting points on individual scans.