The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Jun. 27, 2002
Leping LI, Poughkeepsie, NY (US);
Steven G. Barbee, Amenia, NY (US);
Scott R. Cline, Belle Plaine, MN (US);
James A. Gilhooly, Saint Albans, VT (US);
Walter Imfeld, Zurich, CH;
Werner Moser, St. Gallen, CH;
Adrian Siegrist, Zurich, CH;
Heinz Stunzi, Zurich, CH;
Xinhui Wang, Poughkeepsie, NY (US);
Cong Wei, Poughkeepsie, NY (US);
Leping Li, Poughkeepsie, NY (US);
Steven G. Barbee, Amenia, NY (US);
Scott R. Cline, Belle Plaine, MN (US);
James A. Gilhooly, Saint Albans, VT (US);
Walter Imfeld, Zurich, CH;
Werner Moser, St. Gallen, CH;
Adrian Siegrist, Zurich, CH;
Heinz Stunzi, Zurich, CH;
Xinhui Wang, Poughkeepsie, NY (US);
Cong Wei, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
EcoPhysics AG, Duernten, CH;
Abstract
An apparatus for measuring ammonia gas concentration in an ongoing chemical mechanical polishing (CMP) cycle utilizing an acidic CMP slurry, having the following components: