Zurich, Switzerland

Adrian Siegrist


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):

Title: Adrian Siegrist: Innovator in Chemical Mechanical Polishing Technology

Introduction

Adrian Siegrist is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency of CMP processes.

Latest Patents

Adrian Siegrist holds a patent for an "Apparatus for detecting CMP endpoint in acidic slurries." This invention focuses on measuring ammonia gas concentration during an ongoing CMP cycle that utilizes an acidic CMP slurry. The apparatus is designed to improve the precision and effectiveness of the CMP process.

Career Highlights

Throughout his career, Adrian has worked with prominent companies, including IBM and Ecophysics AG. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology related to chemical processes.

Collaborations

Adrian has collaborated with notable professionals in his field, including Leping Li and Steven G. Barbee. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Adrian Siegrist's contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.

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