Walter Imfeld

Title: Walter Imfeld: Innovator in Chemical Mechanical Polishing Technology

Introduction

Walter Imfeld is a notable inventor based in Hombrechtikon, Switzerland. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology, holding a total of five patents. His work focuses on improving the efficiency and effectiveness of CMP processes, which are crucial in semiconductor manufacturing.

Latest Patents

One of Walter Imfeld's latest patents is an apparatus for detecting CMP endpoint in acidic slurries. This innovative device measures ammonia gas concentration during an ongoing CMP cycle utilizing an acidic CMP slurry. The apparatus features a chemiluminescence detection system that includes a catalytic converter, a reaction chamber, and a light sensor. The catalytic converter, heated to approximately 800°C, transforms the chemical into a different product. The reaction chamber is designed to maintain low pressure, minimizing collisional deactivation of excited species, which allows for real-time detection of the chemical. The light signal generated from the excited species is captured by the light sensor, enabling real-time control of the CMP operation.

Career Highlights

Throughout his career, Walter Imfeld has worked with several prominent companies, including Ortho Diagnostic Systems Inc. and IBM. His experience in these organizations has contributed to his expertise in the field of chemical engineering and technology development.

Collaborations

Walter has collaborated with notable professionals in his field, including Leping Li and James Albert Gilhooly. These collaborations have further enhanced his innovative capabilities and contributed to the advancement of CMP technology.

Conclusion

Walter Imfeld is a distinguished inventor whose work in chemical mechanical polishing technology has led to significant advancements in the industry. His patents and collaborations reflect his commitment to innovation and excellence in his field.