The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2000
Filed:
Aug. 04, 1998
Leping Li, Poughkeepsie, NY (US);
James A Gilhooly, Saint Albans, VT (US);
Clifford O Morgan, III, Burlington, VT (US);
Cong Wei, Poughkeepsie, NY (US);
Werner Moser, Gebertingen, CH;
Matthias Kutter, Staefa, CH;
Joseph Knee, Cromwell, CT (US);
Walter Imfeld, Hombrechtikon, CH;
Bruno Greuter, Wolfhausen, CH;
Heinz Stuenzi, Hombrechtikon, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
Device for in-situ collection of a gaseous reaction product from a polishing slurry as a workpiece, such as a semiconductor wafer, is being polished with the slurry, including a probe capable of being placed in contact with the slurry, the probe having a channel for transmitting the gaseous reaction product to an analyzer, a first hydrophobic membrane for allowing passage of the gaseous reaction product from the slurry to the channel, and means for directing a carrier gas through the channel.