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Poughkeepsie, NY, United States of America

Leping Li

This inventor holds 48 USPTO granted patents, primarily in Chemical Mechanical Polishing. Top assignees: International Business Machines Corporation, Ecophysics Ag, Other. Active years: 1993-2006.

USPTO Granted Patents = 48

% Patents Active = 87.5

Average Co-Inventor Count = 4.3

ph-index = 14

Forward Citations = 1,234(Granted Patents)

Location History:

New Paltz, NY (US) (1993 - 1994)
Poughkeepsie, NY (US) (1995 - 2006)

Company Filing History:

47 out of 166,159

International Business Machines Corporation

1 out of 834,307

Other

patents

where one patent can have more than one assignee

Years Active: 1993-2006

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Areas of Expertise:

Endpoint Detection

Chemical Mechanical Polishing

Real-Time Monitoring

Wet Etch Process

Slurry Sampling

Ionization Current

Film Thickness

Noise Reduction

Chemiluminescence

Oxide/Nitride Interface

Torque-Based Detection

Photoionization

48 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6989683 - Enhanced endpoint detection for wet etch process control (2006-01-24),

2. 6899784 - Apparatus for detecting CMP endpoint in acidic slurries (2005-05-31),

3. 6878629 - Method for detecting CMP endpoint in acidic slurries (2005-04-12),

4. 6843880 - Enhanced endpoint detection for wet etch process control (2005-01-18),

5. 6835117 - Endpoint detection in chemical-mechanical polishing of patterned wafers having a low pattern density (2004-12-28),

6. 6741913 - Technique for noise reduction in a torque-based chemical-mechanical polishing endpoint detection system (2004-05-25),

7. 6506341 - Chemiluminescence detection apparatus (2003-01-14),

8. 6440263 - Indirect endpoint detection by chemical reaction and chemiluminescence (2002-08-27),

9. 6419785 - Endpoint detection by chemical reaction (2002-07-16),

10. 6291351 - Endpoint detection in chemical-mechanical polishing of cloisonne structures (2001-09-18),

11. 6276987 - Chemical mechanical polishing endpoint process control (2001-08-21),

12. 6261851 - Optimization of CMP process by detecting of oxide/nitride interface using IR system (2001-07-17),

13. 6254453 - Optimization of chemical mechanical process by detection of oxide/nitride interface using CLD system (2001-07-03),

14. 6251784 - Real-time control of chemical-mechanical polishing processing by monitoring ionization current (2001-06-26),

15. 6228769 - Endpoint detection by chemical reaction and photoionization (2001-05-08),

Title: The Innovative Journey of Inventor Leping Li

Introduction: Leping Li, a talented inventor based in Poughkeepsie, NY, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Leping Li holds several patents in the areas of artificial intelligence, renewable energy, and nanotechnology, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: With a background in engineering and a passion for problem-solving, Leping Li has had a successful career working for leading tech companies where he has spearheaded projects that have pushed the boundaries of innovation.

Collaborations: Throughout his career, Leping Li has collaborated with top researchers, engineers, and scientists to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Leping Li's relentless pursuit of innovation and his commitment to creating solutions that make a difference have solidified his reputation as a respected inventor in the technology industry.

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