Company Filing History:
1 out of 164,108 
1 out of 1 Years Active: 2005
Title: Heinz Stunzi - Innovator in Chemical Mechanical Polishing Technology
Introduction
Heinz Stunzi is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. His work focuses on enhancing the efficiency and effectiveness of CMP processes, particularly in the semiconductor industry.
Latest Patents
Heinz Stunzi holds a patent for an "Apparatus for detecting CMP endpoint in acidic slurries." This innovative apparatus is designed to measure ammonia gas concentration during an ongoing CMP cycle that utilizes an acidic CMP slurry. This invention plays a crucial role in ensuring optimal performance and precision in CMP operations.
Career Highlights
Throughout his career, Heinz has worked with prominent companies, including IBM and Ecophysics AG. His experience in these organizations has allowed him to develop and refine his expertise in CMP technology, contributing to advancements in the field.
Collaborations
Heinz has collaborated with notable professionals in his field, including Leping Li and Steven G. Barbee. These collaborations have further enriched his work and have led to innovative solutions in CMP technology.
Conclusion
Heinz Stunzi's contributions to the field of chemical mechanical polishing are significant and impactful. His patent and career achievements reflect his dedication to innovation and excellence in technology.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.