The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2004

Filed:

May. 03, 2002
Applicant:
Inventors:

Ho-Ming Tong, Taipei, TW;

Chun-Chi Lee, Kaohsiung, TW;

Jen-Kuang Fang, Pingtung Hsien, TW;

Min-Lung Huang, Kaohsiung, TW;

Jau-Shoung Chen, Hsinchu Hsien, TW;

Ching-Huei Su, Kaohsiung, TW;

Chao-Fu Weng, Tainan, TW;

Yung-Chi Lee, Kaohsiung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 3/100 ; B23K 3/102 ; H01L 2/348 ;
U.S. Cl.
CPC ...
B23K 3/100 ; B23K 3/102 ; H01L 2/348 ;
Abstract

A method of forming bumps on the active surface of a silicon wafer. An under-ball metallic layer is formed over the active surface of the wafer. A plurality of first solder blocks is attached to the upper surface of the under-ball metallic layer. Each first solder block has an upper surface and a lower surface. The lower surface of each first solder block bonds with the under-ball metallic layer. The upper surfaces of the first solder blocks are planarized. A second solder block is attached to the upper surface of each first solder block and then a reflow operation is carried out.


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