The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2023
Filed:
Apr. 24, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Liangfa Hu, San Jose, CA (US);
Prashant Kumar Kulshreshtha, San Jose, CA (US);
Anjana M. Patel, San Jose, CA (US);
Abdul Aziz Khaja, San Jose, CA (US);
Viren Kalsekar, Sunnyvale, CA (US);
Vinay K. Prabhakar, Cupertino, CA (US);
Satya Teja Babu Thokachichu, San Jose, CA (US);
Byung Seok Kwon, San Jose, CA (US);
Ratsamee Limdulpaiboon, San Jose, CA (US);
Kwangduk Douglas Lee, Redwood City, CA (US);
Ganesh Balasubramanian, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present disclosure relates to systems and methods for reducing the formation of hardware residue and minimizing secondary plasma formation during substrate processing in a process chamber. The process chamber may include a gas distribution member configured to flow a first gas into a process volume and generate a plasma therefrom. A second gas is supplied into a lower region of the process volume. Further, an exhaust port is disposed in the lower region to remove excess gases or by-products from the process volume during or after processing.