Company Filing History:
Years Active: 2023-2024
Title: Innovations by Satya Teja Babu Thokachichu
Introduction
Satya Teja Babu Thokachichu is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of chemical vapor deposition, holding 2 patents that showcase his innovative approaches.
Latest Patents
One of his latest patents is focused on the plasma-enhanced chemical vapor deposition of carbon hard-mask. This method involves heating a substrate within a process chamber to a temperature ranging from about 100°C to about 700°C. It also includes producing a plasma with a power generator that emits an RF power of greater than 3 kW. In some instances, the temperature is maintained between 300°C and 700°C, with RF power reaching up to about 7 kW. The method further entails flowing a hydrocarbon precursor into the plasma, resulting in the formation of a carbon hard-mask layer on the substrate at a rate exceeding 5,000/min, potentially reaching up to 10,000/min or faster.
Another notable patent addresses methods of reducing chamber residues. This disclosure relates to systems and methods aimed at minimizing the formation of hardware residue and secondary plasma during substrate processing. The process chamber is designed with a gas distribution member that flows a first gas into the process volume, generating plasma. A second gas is introduced into the lower region of the process volume, while an exhaust port is strategically placed to remove excess gases or by-products during or after processing.
Career Highlights
Satya Teja Babu Thokachichu is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work has significantly advanced the understanding and application of chemical vapor deposition techniques.
Collaborations
He has collaborated with notable coworkers, including Byung Seok Kwon and Prashant Kumar Kulshreshtha, contributing to various innovative projects within the company.
Conclusion
Satya Teja Babu Thokachichu's contributions to the field of chemical vapor deposition through his patents reflect his expertise and innovative spirit. His work continues to influence advancements in materials engineering.