The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2020
Filed:
Jun. 01, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jacqueline S. Wrench, San Jose, CA (US);
Jing Zhou, San Jose, CA (US);
Fuqun Grace Vasiknanonte, Sunnyvale, CA (US);
Jiang Lu, Milpitas, CA (US);
Paul F. Ma, Santa Clara, CA (US);
Nobuyuki Sasaki, Santa Clara, CA (US);
Sree Rangasai V. Kesapragada, Union City, CA (US);
Sang Ho Yu, Cupertino, CA (US);
Mei Chang, Saratoga, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/11551 (2017.01); H01L 27/11578 (2017.01); H01L 21/285 (2006.01); H01L 21/8229 (2006.01); H01L 21/8239 (2006.01); H01L 21/822 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11551 (2013.01); H01L 21/28556 (2013.01); H01L 21/8221 (2013.01); H01L 21/8229 (2013.01); H01L 21/8239 (2013.01); H01L 27/11578 (2013.01);
Abstract
Embodiments of the invention provide methods of processing a substrate having a stack of spaced oxide layers with gaps between the oxide layers. A metallic nucleation layer is formed in the gaps and a cobalt film is deposited on the nucleation layer to form wordlines.